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Proceedings Paper

Photothermal microscopy and laser damage in optical components
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Paper Abstract

The development of applications of high power lasers require new characterization techniques for studying behavior of optical materials under intensive illumination, laser damage phenomena. Destructive investigations in silica have led to the conclusion that absorbing defects, typically a few nanometers in size, were responsible for laser damage initiation. The measured precursor densities are very low. The understanding of the true nature of these defects and damage phenomena requires the development of non destructive evaluation techniques with both high spatial resolution and high detectivity. The capability of collinear photothermal deflection to reach sub-micrometric resolution by reduction of the pump beam diameter has been theoretically and experimentally explored. Its ability to detect single absorbing particles has been studied. Currently 100-nm-diameter gold inclusions can be imaged with a signal-to-noise ratio of 8 at the wavelength 1064nm. Such a photothermal microscope has been coupled with an experimental set-up allowing damage threshold measurement at the same wavelength. Thus behavior of 100-nm-gold inclusions in silica can be studied under irradiation. Further improvements by decreasing wavelength, increasing modulation frequency and by using piezoelectric translation stages, will allow to study 10-nm-inclusions. We present an overview of last developments in the field of photothermal microscopy in connection with laser damage.

Paper Details

Date Published: 4 November 2003
PDF: 13 pages
Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.505890
Show Author Affiliations
Mireille J Commandre, Institut Fresnel, ENSPM (France)
Jean Yves Natoli, Institut Fresnel, ENSPM (France)
Claude Amra, Institut Fresnel, ENSPM (France)
Annelise During, Institut Fresnel, ENSPM (France)
Laurent Gallais, Institut Fresnel, ENSPM (France)


Published in SPIE Proceedings Vol. 5188:
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
Angela Duparre; Bhanwar Singh, Editor(s)

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