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Proceedings Paper

Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements
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Paper Abstract

We report on a new approach in analog photolithography for the manufacturing of optical elements with a continuous profile. It is based on a phase-only mask used in a mask aligner.The advantage of this new approach is that it is contact free, i.e.there is a gap between the mask and the substrate during the exposure. That allows a non-destructive mask lithography.

Paper Details

Date Published: 3 November 2003
PDF: 8 pages
Proc. SPIE 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II, (3 November 2003); doi: 10.1117/12.505751
Show Author Affiliations
Tobias Erdmann, Friedrich-Schiller-Univ. Jena (Germany)
Matthias Cumme, Friedrich-Schiller-Univ. Jena (Germany)
Lars-Christian Wittig, Friedrich-Schiller-Univ. Jena (Germany)
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Frank Wyrowski, Friedrich-Schiller-Univ. Jena (Germany)
Andreas Tuennermann, Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 5183:
Lithographic and Micromachining Techniques for Optical Component Fabrication II
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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