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Proceedings Paper

At-wavelength metrology on Sc-based multilayers for the UV and water window
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Paper Abstract

Due to the unusual behavior of its optical constants the first transition element Sc with atomic configuration (3p64s23d) is a very attractive candidate for multilayer coatings optimized for the anomalous dispersion region of the 3p-3d transition around 28 eV (45 nm) and for the vicinity of the 2p absorption edge at 398 eV (3.12 nm), respectively. New normal incidence reflectivity data for Sc/Si at Sc 3p are shown with peak values up to 54% and for Cr/Sc at Sc 2p with peak values up to 17% are presented. The influence of optical performance on multilayer growth conditions and parameters are discussed in detail and the necessity of at-wavelength metrology for the final characterization is demonstrated. The results encourage e.g. applications for normal incidence optics used for high-power pulsed UV and x-ray laser systems and for x-ray microscopes operated in the water window.

Paper Details

Date Published: 4 November 2003
PDF: 8 pages
Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.505695
Show Author Affiliations
Franz Schaefers, BESSY mbH (Germany)
Sergiy A. Yulin, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Torsten Feigl, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 5188:
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
Angela Duparre; Bhanwar Singh, Editor(s)

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