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Proceedings Paper

Accuracy of optical thin film parameter determination based on spectrophotometric data
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Paper Abstract

Adequate modeling of high quality non-absorbing dielectric thin films requires the inclusion of the degree of bulk inhomogeneity as one of the parameters in the model describing the film. We show that in the case of a satisfactory choice of a thin film model, the main source of errors in the computed optical parameters of high quality films are systematic errors in spectrophotometric data. Based on practical examples and theoretical predictions we estimate that an accuracy of 0.5% in the determination of optical parameters of dielectric thin films should be considered as a good result when viewed in the context of the current state of the art in optical characterization based on spectrophotometric data. A level of accuracy significantly better than this would require an extraordinary effort.

Paper Details

Date Published: 4 November 2003
PDF: 10 pages
Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.505499
Show Author Affiliations
Alexander V Tikhonravov, Moscow State Univ. (Russia)
Michael K. Trubetskov, Moscow State Univ. (Russia)
Gary W. DeBell, MLD Technologies (United States)

Published in SPIE Proceedings Vol. 5188:
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
Angela Duparre; Bhanwar Singh, Editor(s)

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