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Proceedings Paper

Fabrication of polymer cantilevers for force-controlled atomic force microscope
Author(s): Nobuhiro Kato; Choong Sik Park; Toshiro Matsumoto; Hisao Kikuta; Koichi Iwata
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Paper Abstract

We developed the fabrication process of all-plastic cantilever for force controlled atomic force microscope. The force controlled atomic force microscope can prevent damage during the scanning of the soft sample. However it has a drawback in its stability. To stabilize the system the cantilever is required to have small Q factor. The negative photo resist for MEMS (SU-8) has ideal properties, micromachinability and small Q factor, for this purpose. Here we demonstrate the cantilever consists of tip, lever and base with same polyimide. The mold of the probing tip is the pyramidal pit pattern on silicon wafer formed by direct leaser writing and anisotropic etching of silicon. Other elements of the cantilever are formed by contact lithography. The photo mask is also fabricated by direct laser writing. By arranging the dimensions of the cantilever, we can control its spring constant and resonant frequency. For the spring constant of 0.1N/m and the first resonant frequency of 2kHz, the typical dimensions of the cantilever is 1030 x 300 x 7 μm3. The fabrication error in cantilever geometry was 1.5%. The estimated resonant frequency has a good agreement with the designed value.

Paper Details

Date Published: 3 November 2003
PDF: 8 pages
Proc. SPIE 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II, (3 November 2003); doi: 10.1117/12.505434
Show Author Affiliations
Nobuhiro Kato, Kinki Univ. (Japan)
Choong Sik Park, Technology Research Institute of Osaka Prefecture (Japan)
Toshiro Matsumoto, Kinki Univ. (Japan)
Hisao Kikuta, Osaka Prefecture Univ. (Japan)
Koichi Iwata, Osaka Prefecture Univ. (Japan)


Published in SPIE Proceedings Vol. 5183:
Lithographic and Micromachining Techniques for Optical Component Fabrication II
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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