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Proceedings Paper

Fabrication of micro-optical elements on a glass surface by imprint lithography
Author(s): Takehiko Yamaguchi; Kazuyuki Yao; Tomohiro Kanakugi; Seiichirou Kitagawa; Yoshihiko Hirai
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Paper Abstract

Low-cost micro fabrication technique is indispensable for mass production of micro optical elements. Si very large-scale integration (VLSI) fabrication technology such as electron beam lithography or advanced photo lithography is generally applied to fabricate micro structures, however the production cost is too expensive for mass production of optical elements. To overcome the problem, imprint lithography is one of the promising method to fabricate micro structures at low cost. Various shaped mold is fabricated by semiconductor process technology. Process conditions such as temperature or pressure are designed to avoid fracture of the glass plate. Fine gratings, fine blazed and various shaped structures are successfully achieved on the glass surface without fatal defects. The cross-sectional profile of the imprinted structure is fairly good and surface roughness is less than a few nano meters.

Paper Details

Date Published: 3 November 2003
PDF: 9 pages
Proc. SPIE 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II, (3 November 2003); doi: 10.1117/12.505413
Show Author Affiliations
Takehiko Yamaguchi, Nalux Co., Ltd. (Japan)
Kazuyuki Yao, Nalux Co., Ltd. (Japan)
Tomohiro Kanakugi, Osaka Prefecture Univ. (Japan)
Seiichirou Kitagawa, Nalux Co., Ltd. (Japan)
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)


Published in SPIE Proceedings Vol. 5183:
Lithographic and Micromachining Techniques for Optical Component Fabrication II
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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