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Proceedings Paper

Beryllium scatter analysis program
Author(s): Jerry L. Behlau; Edward M. Granger; John J. Hannon; Mark Baumler; James F. Reilly
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Paper Abstract

Many groups today are researching the characteristics of beryllium, in an attempt to find ways of producing high quality (low scatter) stable beryllium optics. This paper discusses a two-part study in which (1) an attempt is being made to determine the best, raw beryllium mixture and preparation, machining and polishing processes, test and analysis methods, and (2) a proposed model for the prediction of scatter from beryllium surfaces (based on a knowledge of surface and subsurface interactions with incident wavelengths) will be refined against empirical data. We discuss design of the experiment, the model, and some of the early results.

Paper Details

Date Published: 1 December 1991
PDF: 13 pages
Proc. SPIE 1530, Optical Scatter: Applications, Measurement, and Theory, (1 December 1991); doi: 10.1117/12.50511
Show Author Affiliations
Jerry L. Behlau, Eastman Kodak Co. (United States)
Edward M. Granger, Eastman Kodak Co. (United States)
John J. Hannon, Eastman Kodak Co. (United States)
Mark Baumler, Eastman Kodak Co. (United States)
James F. Reilly, Rome Lab. (United States)


Published in SPIE Proceedings Vol. 1530:
Optical Scatter: Applications, Measurement, and Theory
John C. Stover, Editor(s)

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