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Proceedings Paper

Improving metrology for micro-optics manufacturing
Author(s): Angela D. Davies; Brent C. Bergner; Neil W. Gardner
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Paper Abstract

Metrology is one of the critical enabling technologies for realizing the full market potential for micro-optical systems. Measurement capabilities are currently far behind present and future needs. Much of today’s test equipment was developed for the micro-electronics industry and is not optimized for micro-optic materials and geometries. Metrology capabilities currently limit the components that can be realized, in many cases. Improved testing will be come increasingly important as the technology moves to integration where it will become important to “test early and test often” to achieve high yields. In this paper, we focus on micro-refractive components in particular, and describe measurement challenges for this class of components and current and future needs. We also describe a new micro-optics metrology research program at UNC Charlotte under the Center for Precision Metrology and the new Center for Optoelectronics and Optical Communications to address these needs.

Paper Details

Date Published: 10 November 2003
PDF: 15 pages
Proc. SPIE 5177, Gradient Index, Miniature, and Diffractive Optical Systems III, (10 November 2003); doi: 10.1117/12.505057
Show Author Affiliations
Angela D. Davies, Univ. of North Carolina/Charlotte (United States)
Brent C. Bergner, Univ. of North Carolina/Charlotte (United States)
Neil W. Gardner, Univ. of Florida (United States)


Published in SPIE Proceedings Vol. 5177:
Gradient Index, Miniature, and Diffractive Optical Systems III
Thomas J. Suleski, Editor(s)

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