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Proceedings Paper

Mask and source optimization for lithographic imaging systems
Author(s): Andreas Erdmann; Richard Farkas; Tim Fuehner; Bernd Tollkuehn; Gabriela Kokai
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Paper Abstract

This article proposes a new optimization procedure for mask and illumination geometries in optical projection lithography. A general merit function is introduced that evaluates the imaging performance of arbitrary line patterns over a certain focus range. It also takes into account certain technological aspects that are defined by the manufacturability and inspectability of the mask. Automatic optimization of the mask and illumination parameters with a genetic algorithm identifies optimum imaging conditions without any additional a-priori knowledge about lithographic processes. Several examples demonstrate the potential of the proposed concept.

Paper Details

Date Published: 31 December 2003
PDF: 15 pages
Proc. SPIE 5182, Wave-Optical Systems Engineering II, (31 December 2003); doi: 10.1117/12.504732
Show Author Affiliations
Andreas Erdmann, Fraunhofer-Institut fuer Integrierte Systeme und Bauelementetechnologie (Germany)
Richard Farkas, Friedrich-Alexander Univ. Erlangen-Nuernberg (Germany)
Tim Fuehner, Fraunhofer-Institut fuer Integrierte Systeme und Bauelementetechnologie (Germany)
Bernd Tollkuehn, Fraunhofer-Institut fuer Integrierte Systeme und Bauelementetechnologie (Germany)
Gabriela Kokai, Friedrich-Alexander Univ. Erlangen-Nuernberg (Germany)

Published in SPIE Proceedings Vol. 5182:
Wave-Optical Systems Engineering II
Frank Wyrowski, Editor(s)

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