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Proceedings Paper

Scanning probe lithography of self-assembled monolayers
Author(s): Guohua Yang; Nabil A. Amro; Gang-yu Liu
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Paper Abstract

Systematic studies on scanning probe lithography (SPL) methodologies have been performed using self-assembled monolayers (SAMs) on Au as examples. The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. Approaches include three atomic force microscopy (AFM) based methods, nanoshaving, nanografting, and nanopen reader and writer (NPRW), which rely on the local force, and two scanning tunneling microscopy (STM) based techniques, field-induced desorption and electron-induced desorption, which use electric field and tunneling electrons, respectively, for nanofabrication. The principle of these procedures, the critical steps in controlling local tip-surface interactions, and nanofabrication media will be discussed. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns.

Paper Details

Date Published: 15 October 2003
PDF: 14 pages
Proc. SPIE 5220, Nanofabrication Technologies, (15 October 2003); doi: 10.1117/12.504613
Show Author Affiliations
Guohua Yang, Univ. of California, Davis (United States)
Nabil A. Amro, Univ. of California, Davis (United States)
Gang-yu Liu, Univ. of California, Davis (United States)

Published in SPIE Proceedings Vol. 5220:
Nanofabrication Technologies
Elizabeth A. Dobisz, Editor(s)

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