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Proceedings Paper

E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures
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Paper Abstract

Today’s technologies available for the fabrication of micro structured optical elements are well developed for defined classes of structures. Techniques for very complex optical functions or for combinations of optical functions together with others are more or less in the level of research or labs. A promising approach for complex grating fabrication is the use of optical near field holography (NFH) and e-beam writing for unification of the advantages. The paper wants to show the potential of both techniques itself as well as the potential that arises from their teamwork. The paper demonstrates one and two dimensional gratings, chirped and unidirectional gratings fabricated by NFH using e-beam written masks. It shows also possibilities for the fabrication of gratings on binary, multilevel and continuous optical profiles.

Paper Details

Date Published: 29 December 2003
PDF: 11 pages
Proc. SPIE 5184, Physics, Theory, and Applications of Periodic Structures in Optics II, (29 December 2003); doi: 10.1117/12.504583
Show Author Affiliations
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Tina Clausnitzer, Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 5184:
Physics, Theory, and Applications of Periodic Structures in Optics II
Philippe Lalanne, Editor(s)

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