Share Email Print
cover

Proceedings Paper

New approach to measurement of photoactive deep-UV optics contaminants at sub parts-per-trillion levels
Author(s): Chris Atkinson; Jeff Hanson; Oleg P. Kishkovich; Michael Paul Alexander; Anatoly Grayfer
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A new sampling device and collection method has been developed to provide an accurate and convenient means for collecting ultra low levels of condensable organic species. The sample collection and analytical method are optimized to separate, quantify, and identify individual organic components at a detection limit of approximately 0.001 μg/m3, representing a hundred fold improvement over conventional sampling methods. Given the potential threats that these contaminants pose to deep UV lithography optics, the work represents a new step in understanding the long-term risks to production 193nm exposure tools. Devices deployed at an Texas Instruments manufacturing facility have generated data that proves that this sampling device and method is capable of measuring contamination at levels never achieved before. This data will be used to develop correlation of optics degradation with different classes of airborne molecular contamination.

Paper Details

Date Published: 16 June 2003
PDF: 11 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.504574
Show Author Affiliations
Chris Atkinson, Texas Instruments Inc. (United States)
Jeff Hanson, Texas Instruments Inc. (United States)
Oleg P. Kishkovich, Extraction Systems Inc. (United States)
Michael Paul Alexander, Extraction Systems Inc. (United States)
Anatoly Grayfer, Extraction Systems Inc. (United States)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

© SPIE. Terms of Use
Back to Top