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Proceedings Paper

High-conversion-efficiency tin material laser-plasma source for EUVL
Author(s): Chiew-Seng Koay; Christian K. Keyser; K. Takenoshita; Etsuo Fujiwara; Moza M. Al-Rabban; Martin C. Richardson; I. C. Edmond Turcu; Harry Rieger; A. Stone; James H. Morris
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Paper Abstract

One of the key leverage factors in determining the viability of laser-plasma sources for EUVL is the conversion efficiency of laser light to EUV emission in the 13-nm region. We describe experiments and theoretical calculations on a mass-limited laser target design using tin that offers high conversion efficiency.

Paper Details

Date Published: 16 June 2003
PDF: 6 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.504572
Show Author Affiliations
Chiew-Seng Koay, CREOL/Univ. of Central Florida (United States)
Christian K. Keyser, CREOL/Univ. of Central Florida (United States)
K. Takenoshita, CREOL/Univ. of Central Florida (United States)
Etsuo Fujiwara, CREOL/Univ. of Central Florida (United States)
Moza M. Al-Rabban, CREOL/Univ. of Central Florida (United States)
Qatar Univ. (Qatar)
Martin C. Richardson, CREOL/Univ. of Central Florida (United States)
I. C. Edmond Turcu, JMAR Technologies Inc. (United States)
Harry Rieger, JMAR Technologies Inc. (United States)
A. Stone, JMAR Technologies Inc. (United States)
James H. Morris, JMAR Technologies Inc. (United States)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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