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Proceedings Paper

EUV time-resolved studies on carbon growth and cleaning
Author(s): Bas Mertens; Bas Wolschrijn; Rik Jansen; Norbert B. Koster; Markus Weiss; Marco Wedowski; Roman Markus Klein; Thomas Bock; Reiner Thornagel
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Paper Abstract

This paper presents first results to assess the feasibility of a cleaning strategy for EUV production tools. The EUV experiments were performed in a dedicated UHV contamination chamber connected to the DLW20 dipole beam line at the PTB laboratories at BESSY II in Berlin. An in-situ reflectometry system has been implemented inside the contamination chamber to allow for real-time detection of mirror reflection changes. The reproducibility of the in-situ reflectometry system has proven to be about 0.03%, allowing the measurement of reflection changes below 0.1%. Cleaning cycles were performed at producation tool power density levels, i,e,, 10-30 mW/mm2 broadband radiation, on capped Mo/Si mirror samples. Carbon was deposited intentionally at ypical hydrocarbon pressures in the 10-8 mbar regime. Cleaning was done at background levels of hydrocarbons and 10-4 mbar molecular oxygen. First results show that cleaning of a mirror at high power densities and typical tool conditions can restore the reflection close to its initial value.

Paper Details

Date Published: 16 June 2003
PDF: 8 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.504542
Show Author Affiliations
Bas Mertens, TNO TPD (Netherlands)
Bas Wolschrijn, TNO TPD (Netherlands)
Rik Jansen, TNO TPD (Netherlands)
Norbert B. Koster, TNO TPD (Netherlands)
Markus Weiss, Carl Zeiss SMT AG (Germany)
Marco Wedowski, Carl Zeiss SMT AG (Germany)
Roman Markus Klein, Physikalisch-Technische Bundesanstalt (Germany)
Thomas Bock, Physikalisch-Technische Bundesanstalt (Germany)
Reiner Thornagel, Physikalisch-Technische Bundesanstalt (Germany)

Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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