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Proceedings Paper

Study of characteristics and control of haze contamination induced by photochemical reaction
Author(s): Sung-Jae Han; Sang-Yong Yu; Moon-Gyu Sung; Yong-Hoon Kim; Hee-Sun Yoon; Jung-Min Sohn
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Paper Abstract

Haze is a kind of surface contamination on photomask and lithography optics that made by photochemical reaction. There are many problems in photomask manufacturing, inspection and lithography process because of slowly growing feature of haze. In the photolithography process, the wafer damage has been occurred due to the time dependent growth of haze. In this study, we identified the origin and formation mechanism of haze using accelerated contamination experiments, also developed control method for haze, in which the removal efficiency was confirmed by mass production of photomask. From these results we expect that the photocontamination control technology should be developed and been an important part of NGL technology.

Paper Details

Date Published: 28 August 2003
PDF: 5 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504277
Show Author Affiliations
Sung-Jae Han, Samsung Electronics Co., Ltd. (South Korea)
Sang-Yong Yu, Samsung Electronics Co., Ltd. (South Korea)
Moon-Gyu Sung, Samsung Electronics Co., Ltd. (South Korea)
Yong-Hoon Kim, Samsung Electronics Co., Ltd. (South Korea)
Hee-Sun Yoon, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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