Share Email Print
cover

Proceedings Paper

Arbitrary pattern fabrication with a LCD reticle-free exposure method
Author(s): Tatsuo Morimoto; Kazumitsu Nakamura; Hiroshi Kubota; Akira Nakada; Takayuki Akamichi; Tsuneo Inokuchi; Kouji Kosaka
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We describe a newly developed technique that uses optical projection lithography with a liquid crystal display (LCD) in place of a conventional reticle, in order to minimize turn-around-time and production cost. Circuit pattern data, generated by a computer aided design (CAD) system, is transferred directly to a control computer. The control computer converts the data into an equivalent dot matrix representation of the design for use on a LCD. The LCD is placed in a conventional optical stepper. One feature of this system is the simplicity of the data management scheme which permits the data to be handled by a computer file directly; without any of the manual assistance normally needed in conventional reticle fabrication. It is a very convenient method to reverse reticle tone by changing the LCD mode; easy compared to a conventional reticle manufacturing process. The minimum resolution of this proposed system is very similar to conventional systems that use optical reticles. We have demonstrated that this LCD Reticle-Free Exposure Method has the potential of replacing conventional reticles in optical stepper lithography. This method is applicable for manufacturing devices with relatively large fabrication rules and low production quantities, such as System-in-Package applications.

Paper Details

Date Published: 28 August 2003
PDF: 10 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504264
Show Author Affiliations
Tatsuo Morimoto, Kumamoto Technology and Industry Foundation (Japan)
Kazumitsu Nakamura, Kumamoto Technology and Industry Foundation (Japan)
Hiroshi Kubota, Kumamoto Univ. (Japan)
Akira Nakada, Kumamoto Univ. (Japan)
Takayuki Akamichi, Kumamoto Univ. (Japan)
Tsuneo Inokuchi, Sony Semiconductor Kyushu Corp. (Japan)
Kouji Kosaka, Kumamoto Technology Inc. (Japan)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

© SPIE. Terms of Use
Back to Top