Share Email Print
cover

Proceedings Paper

Low-energy electron-beam lithography for NGL mask making
Author(s): Dominique Drouin; Eric Lavallee; Jacques Beauvais; M. Cloutier; L. K. Mun
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
PDF
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, ; doi: 10.1117/12.504263
Show Author Affiliations
Dominique Drouin, Quantiscript Inc. (Canada)
Eric Lavallee, Quantiscript Inc. (Canada)
Jacques Beauvais, Quantiscript Inc. (Canada)
M. Cloutier, Quantiscript Inc. (Canada)
L. K. Mun, Quantiscript Inc. (Canada)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

© SPIE. Terms of Use
Back to Top