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Proceedings Paper

On-site use of 1x stencil mask: control over image placement and dimension
Author(s): Shinji Omori; Kazuya Iwase; Yoko Watanabe; Keiko Amai; Takayuki Sasaki; Shoji Nohama; Isao Ashida; Shigeru Moriya; Tetuya Kitagawa
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Paper Abstract

We propose the efficient on-site use of a 1x stencil mask for proximity electron lithography (PEL) for controlling image placement (IP) and critical dimension (CD). It has been demonstrated that the integrated approach to the IP-error correction on the mask-fabrication level using the data manipulation and the mask-exposure level using the deflection of an electron beam (EB) can meet the requirement for the overlay accuracy in the 65-nm technology node. Also, the time-dependent variation in mask CD due to EB-assisted contamination growth can be managed by using the combination of the dose control and the periodic dry cleaning of the mask.

Paper Details

Date Published: 28 August 2003
PDF: 12 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504258
Show Author Affiliations
Shinji Omori, Sony Corp. (Japan)
Kazuya Iwase, Sony Corp. (Japan)
Yoko Watanabe, Sony Corp. (Japan)
Keiko Amai, Sony Corp. (Japan)
Takayuki Sasaki, Sony Corp. (Japan)
Shoji Nohama, Sony Corp. (Japan)
Isao Ashida, Sony Corp. (Japan)
Shigeru Moriya, Sony Corp. (Japan)
Tetuya Kitagawa, Sony Corp. (Japan)

Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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