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Proceedings Paper

EPL mask data conversion system EPLON
Author(s): Kokoro Kato; Kuninori Nishizawa; Tamae Haruki; Tadao Inoue
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Paper Abstract

EPLON is the name of a system that we have been developing as a data conversion system for EPL masks in order to meet the requirements of EPL stencil masks. In our paper we presented in PMJ2002, we proved that our system could convert the whole chip data. However we still had some problems to overcome, one of which is a problem of conversion time and another issue is a data volume problem. This paper presents the features of our multi process computation method and the data compaction with building a hierarchy from the flattened data.

Paper Details

Date Published: 28 August 2003
PDF: 9 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504245
Show Author Affiliations
Kokoro Kato, Seiko Instruments Inc. (Japan)
Kuninori Nishizawa, Seiko Instruments Inc. (Japan)
Tamae Haruki, Seiko Instruments Inc. (Japan)
Tadao Inoue, Seiko Instruments Inc. (Japan)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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