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Proceedings Paper

Application results achieved with LINUX cluster for data preparation
Author(s): Juergen Gramss; Melchior Lemke; Hans Eichhorn; Voler Neick; Michael Kramer; Erhard Stache
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Paper Abstract

The ever growing layout complexity and escalating data volumes to be handled in high-end mask making processes using variable-shaped beam writers (VSB) require totally new computing and software solutions for data preparation. The high-performance, cost-effective LINUX Cluster is the ideal tool to manage these challenging tasks and, in addition, offers the advantage of being upgradable and expandable for meeting future lithography requirements. In this paper different computer configurations are analyzed. As a logical consequence the data conversion issue, including Proximity Effect Correction, of VSB e-beam systems and their specific data formats are also reflected in this investigation. Distributed and multi-threading computing is compared highlighting the advantages of the distributed approach.

Paper Details

Date Published: 28 August 2003
PDF: 9 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504219
Show Author Affiliations
Juergen Gramss, Leica Microsystems Lithography GmbH (Germany)
Melchior Lemke, Leica Microsystems Lithography GmbH (Germany)
Hans Eichhorn, Leica Microsystems Lithography GmbH (Germany)
Voler Neick, Leica Microsystems Lithography GmbH (Germany)
Michael Kramer, Photronics MZD GmbH & Co. KG (Germany)
Erhard Stache, Photronics MZD GmbH & Co. KG (Germany)

Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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