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Proceedings Paper

Actinic aerial image measurement tool for 157-nm mask qualification
Author(s): Takashi Yasui; Iwao Higashikawa; Peter Kuschnerus; Thomas Engel; Axel M. Zibold; Claudia Hertfelder; Yuji Kobiyama; Jan-Peter Urbach; Christof M. Schilz; Armin Semmler
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Paper Abstract

The challenge to achieve an early introduction of 157 nm lithography requires various advanced metrology systems to evaluate the 65 nm node lithography performances, equipments and processes. Carl Zeiss AIMS tool based on the Aerial Image Measurement Software is the most promising approach to evaluate the mask quality in terms of aerial image properties, in order to assess post repair quality. Selete has joint activities with Carl Zeiss, International SEMATECH and Infineon to accelerate the development of an AIMS tool operating at the 157 nm wavelength. The alpha tool phase of the project has been completed, and beta tools are currently being built. This paper is discussing the results from measurements on the alpha tool of some 157 nm attenuated phase shift masks (Att-PSM). Resolution results and CD evaluation with respect to these measurements will be presented.

Paper Details

Date Published: 28 August 2003
PDF: 12 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504215
Show Author Affiliations
Takashi Yasui, Semiconductor Leading Edge Technologies, Inc. (Japan)
Iwao Higashikawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Peter Kuschnerus, Carl Zeiss Microelectronic Systems GmbH (Germany)
Thomas Engel, Carl Zeiss Microelectronic Systems GmbH (Germany)
Axel M. Zibold, Carl Zeiss Microelectronic Systems GmbH (Germany)
Claudia Hertfelder, Carl Zeiss Microelectronic Systems GmbH (Germany)
Yuji Kobiyama, Carl Zeiss Japan Co., Ltd. (Japan)
Jan-Peter Urbach, International SEMATECH (United States)
Christof M. Schilz, Infineon Technologies AG (Germany)
Armin Semmler, Infineon Technologies AG (Germany)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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