Share Email Print
cover

Proceedings Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Author(s): Ryoji Hagiwara; Anto Yasaka; Kazuo Aita; Osamu Takaoka; Yoshihiro Koyama; Tomokazu Kozakai; Toshio Doi; Masashi Muramatsu; Katsumi Suzuki; Yasuhiko Sugiyama; Osamu Matsuda; Mamoru Okabe; Shoji Shinohara; Masakatsu Hasuda; Tatsuya Adachi; Yasutaka Morikawa; Masaharu Nishiguchi; Yasushi Sato; Naoya Hayashi; Toshiya Ozawa; Yoshihiro Tanaka; Nobuyuki Yoshioka
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Photomask is a key factor to support the lithography technology. Defect repairing technology has become more important than ever to keeping the photomasks' integrity in the manufacturing processes. The SIR5000 is a photomask defect repair system for ArF/90 nm generation lithography. In this work, the repaired masks by the SIR5000 were evaluated by an Aerial Imaging Microscope System (AIMS) and Atomic Force Microscope (AFM). These test results do not show actual printing condition on wafer, but rather a simulated lithography image. In this paper, we present the imaging damage, the edge placement repeatability, the repair area's transmission and the printing performance on wafer. An ArF scanner was employed for the tests on the imaging damage and the printing performance. The transmission of imaged area is more than 95% after 70 scanning frames. The edge placement has shown the 90 nm node repair capability. The transmission of repaired area is no issue by AIMS193 analysis. The actual printing result on wafer has shown there is no printing issue. The SIR5000 is well suited for ArF generation lithography.

Paper Details

Date Published: 28 August 2003
PDF: 10 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504212
Show Author Affiliations
Ryoji Hagiwara, Seiko Instruments, Inc. (Japan)
Anto Yasaka, Seiko Instruments, Inc. (Japan)
Kazuo Aita, Seiko Instruments, Inc. (Japan)
Osamu Takaoka, Seiko Instruments, Inc. (Japan)
Yoshihiro Koyama, Seiko Instruments, Inc. (Japan)
Tomokazu Kozakai, Seiko Instruments, Inc. (Japan)
Toshio Doi, Seiko Instruments, Inc. (Japan)
Masashi Muramatsu, Seiko Instruments, Inc. (Japan)
Katsumi Suzuki, Seiko Instruments, Inc. (Japan)
Yasuhiko Sugiyama, Seiko Instruments, Inc. (Japan)
Osamu Matsuda, Seiko Instruments, Inc. (Japan)
Mamoru Okabe, Seiko Instruments, Inc. (Japan)
Shoji Shinohara, Seiko Instruments, Inc. (Japan)
Masakatsu Hasuda, Seiko Instruments, Inc. (Japan)
Tatsuya Adachi, Seiko Instruments, Inc. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Masaharu Nishiguchi, Dai Nippon Printing Co., Ltd. (Japan)
Yasushi Sato, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Toshiya Ozawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yoshihiro Tanaka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

© SPIE. Terms of Use
Back to Top