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Proceedings Paper

Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography
Author(s): Motonari Tateno; Naohisa Takayama; Shingo Murakami; Keiichi Hatta; Shinji Akima; Fuyuhiko Matsuo; Masao Otaki; Byung-Gook Kim; Keishi Tanaka; Nobuyuki Yoshioka
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Paper Abstract

We have improved DUV laser reticle inspection system LM7000 for 90 nm technology node devices. To increase inspection sensitivity, we developed a reflected light inspection as a supplementary method to transmittance light inspection. We have also strengthened inspection algorithm to distinguish between real defects and very small features from optical proximity effect correction (OPC). Finally, we have improved reference image for die to database inspection. With the merit of short wavelength of LM7000 (266 nm), the inspection sensitivity of the high-transmittance half-tone phase shift mask (HTPSM) does not deteriorated so severely compared to that of binary mask. With the help of these series of improvements, LM7000 could shows inspection capability for OPC masks and HTPSM for ArF lithography. The inspection capability of LM7000 was proved with the programmed defect masks and printability experiment using ArF scanner.

Paper Details

Date Published: 28 August 2003
PDF: 8 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504206
Show Author Affiliations
Motonari Tateno, NEC Corp. (Japan)
Naohisa Takayama, NEC Corp. (Japan)
Shingo Murakami, NEC Corp. (Japan)
Keiichi Hatta, NEC Corp. (Japan)
Shinji Akima, Toppan Printing Co., Ltd. (Japan)
Fuyuhiko Matsuo, Toppan Printing Co., Ltd. (Japan)
Masao Otaki, Toppan Printing Co., Ltd. (Japan)
Byung-Gook Kim, Semiconductor Leading Edge Technologies, Inc. (Japan)
Keishi Tanaka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)

Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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