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Proceedings Paper

Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
Author(s): Wolfgang Dettmann; Jan P. Heumann; Tanja Hagner; Roderick Koehle; Stephen Rahn; Martin Verbeek; Mardjan Zarrabian; Jens Weckesser; Mario Hennig; Nicolo Morgana
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Paper Abstract

With alternating phase shift masks (altPSM) an enhancement technique is available to realize smaller design rules. Meanwhile the basic production process for this mask type is well known and established for 193nm technology development. The qualification of the masks is now in the focus of development work. Sensitive defect inspection is essential for the qualification of altPSMs. In addition accurate phase and transmission balancing measurement technique has to be applied. In this paper we are presenting a detailed defect printability study for sub-100nm feature size technology at 193nm wavelength. Programmed quartz defects with different shapes and sizes were designed. They were implemented in a lines/spaces altPSM design. The processed quartz defects were characterized with a scanning electron microscope and an arial imaging microscope system. The printing behavior of the defects was analyzed after wafer exposures. In addition the required sensitivity for the altPSM inspection was evaluated. Finally the inspection sensitivity was characterized and optimized with programmed and production like defects.

Paper Details

Date Published: 28 August 2003
PDF: 8 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504202
Show Author Affiliations
Wolfgang Dettmann, Infineon Technologies AG (Germany)
Jan P. Heumann, Infineon Technologies AG (Germany)
Tanja Hagner, Infineon Technologies AG (Germany)
Roderick Koehle, Infineon Technologies AG (Germany)
Stephen Rahn, Infineon Technologies AG (Germany)
Martin Verbeek, Infineon Technologies AG (Germany)
Mardjan Zarrabian, Infineon Technologies AG (Germany)
Jens Weckesser, Infineon Technologies AG (Germany)
Mario Hennig, Infineon Technologies AG (Germany)
Nicolo Morgana, Infineon Technologies AG (Germany)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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