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Proceedings Paper

Negative chemically amplified resist in making mask for a logic device with high pattern density
Author(s): Kyung-Han Nam; Hyun-Joon Cho; Seung Hee Baek; Seong-Ho Jeong; Chang-Nam Ahn; Hong-Seok Kim
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Paper Abstract

Recently there has been significant interest in the using of chemically amplified (CA) resists for the mask making industry because of their high sensitivity, high contrast, and good dry etch resistance. Especially positive CA resists with high acceleration voltage E-beam systems are being become the main stream of making for advanced masks. However, the positive CA resists often make the issue of the CD uniformity degradation by the fogging effect at a high acceleration voltage (50keV) E-beam writing tool as writing for masks, which are having a high pattern density. In previous our paper, we have already confirmed that a positive CA resist shows the CD uniformity error more than 30nm by the fogging effect at the mask which is having above 40% pattern density, even if its CD uniformity error value is smaller than 50nm of ZEP. In this paper, we have described and studied for the performances of the negative CA resist at the 50keV e-beam writing tools in advanced mask making like logic device with high pattern density and we have compared with a positive CA resist at the 50keV e-beam writing tools. Furthermore, we have confirmed that the negative CA resist have an advantage what is in advanced mask making process like logic device masks with high pattern density at 50keV e-beam writing tool and they have been compared with the positive CA resist.

Paper Details

Date Published: 28 August 2003
PDF: 8 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504188
Show Author Affiliations
Kyung-Han Nam, DuPont Photomasks Korea Ltd. (South Korea)
Hyun-Joon Cho, DuPont Photomasks Korea Ltd. (South Korea)
Seung Hee Baek, DuPont Photomasks Korea Ltd. (South Korea)
Seong-Ho Jeong, DuPont Photomasks Korea Ltd. (South Korea)
Chang-Nam Ahn, DuPont Photomasks Korea Ltd. (South Korea)
Hong-Seok Kim, DuPont Photomasks Korea Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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