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Proceedings Paper

CAR blanks performance for advanced reticle fabrication
Author(s): Masahiro Hashimoto; Yasunori Yokoya; Takao Higuchi; Fumiko Ohta; Shouichi Kawashima; Yasushi Ohkubo
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Paper Abstract

DUV (Deep Ultra-Violet) laser reticle writers were released to the market for advanced reticle fabrication in 2002, AZ-DX1100P resist (for KrF lithography) has historically been employed for these tools. To respond to further high-end requirements, a new resist more friendly to DUV reticle fabrication is needed. FEP171 is a positive-type CAR (Chemically amplified resist) developed for EB reticle fabrication, which is sensitive to DUV as well. In this paper, we have investigated the applicability of FEP171-coated blanks for DUV reticle fabrication. As the results show, FEP171 could achieve 200 nm patterns by DUV exposure. FEP171 blanks showed superior performance in resolution and profile as compared to AZ-DX1100P. FEP171 blanks are promising for DUV reticle fabrication as well as EB reticle fabrication.

Paper Details

Date Published: 28 August 2003
PDF: 13 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504183
Show Author Affiliations
Masahiro Hashimoto, HOYA Corp. (Japan)
Yasunori Yokoya, HOYA Corp. (Japan)
Takao Higuchi, HOYA Corp. (Japan)
Fumiko Ohta, HOYA Corp. (Japan)
Shouichi Kawashima, HOYA Corp. (Japan)
Yasushi Ohkubo, HOYA Corp. (Japan)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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