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Proceedings Paper

Improvement of critical dimension stability of chemically amplified resist by overcoat II
Author(s): Teruhiko Kumada; Koji Tange; Kazuyuki Maetoko; Kunihiro Hosono; Masayoshi Tsuzuki; Kyoichi Yonetani; Reiji Terada; Yukio Nakashiba; Shingo Anzai; Yasutaka Kikuchi
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Paper Abstract

The critical dimensions (CD) change by the process delay is the most critical issue to apply the chemically amplified resists (CAR) for photomask fabrication. In the photomask fabrication processes, the resist should have both post coating delay (PCD) and post exposure delay (PED) stability, while keeping higher sensitivity. To achieve this requirement, overcoat process has been examined for the purpose of CD stabilization in CAR process for photomask manufacture. The material, which consists of hydrophobic polymer and PAG, was used for the overcoat in this study. Consequently, it has become clear that pattern formations have been possible without unnecessary thickness loss. Moreover, it has been proved that the overcoat shows the effect of controlling CD change and improvement of CD uniformity. From these results, it is thought that the overcoat process is promising for the size stabilization in photomask manufacture for devices less than 90 nm.

Paper Details

Date Published: 28 August 2003
PDF: 6 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504182
Show Author Affiliations
Teruhiko Kumada, Mitsubishi Electric Corp. (Japan)
Koji Tange, Renesas Technology Corp. (Japan)
Kazuyuki Maetoko, Renesas Technology Corp. (Japan)
Kunihiro Hosono, Renesas Technology Corp. (Japan)
Masayoshi Tsuzuki, Toppan Printing Co., Ltd. (Japan)
Kyoichi Yonetani, Toppan Printing Co., Ltd. (Japan)
Reiji Terada, Toppan Printing Co., Ltd. (Japan)
Yukio Nakashiba, Toppan Printing Co., Ltd. (Japan)
Shingo Anzai, Toppan Printing Co., Ltd. (Japan)
Yasutaka Kikuchi, Toppan Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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