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Proceedings Paper

Study on EUV emission properties of laser-produced plasma at ILE, Osaka
Author(s): Mitsuo Nakai; Hiroaki Nishimura; Keisuke Shigemori; Noriaki Miyanaga; Takayoshi Norimatsu; Keiji Nagai; Ryoji Matsui; Takehiro Hibino; Tomoharu Okuno; F. S. Sohbatzadeh; Y. Tao; Kazuhisa Hashimoto; Michiteru Yamaura; Shinsuke Fujioka; Hideo Nagatomo; Vasilii Zhakhovskii; Katsunobu Nishihara; Shigeaki Uchida; Yoshinori Shimada; Hiroyuki Furukawa; Masahiro Nakatsuka; Yasukazu Izawa
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Paper Abstract

A new research project on extreme ultraviolet (EUV) source development has just been started at the Institute of Laser Engineering, Osaka University. The main task of this project is to find a scientific basis for generating efficient, high-quality, high power EUV plasma source for semiconductor industry. A set of experimental data is to be provided to develop a detailed atomic model included in computer code through experiments using GEKKO-XII high power laser and smaller but high-repetitive lasers. Optimum conditions for efficient EUV generation will be investigated by changing properties of lasers and targets. As the first step of the experiments, spherical solid tin and tin-oxide targets were illuminated uniformly with twelve beams from the GEKKO XII. It has been confirmed that maximum conversion efficiency into 13.5 nm EUV light is achieved at illumination intensity less than 2 x 1011 W/cm2. No significant difference is found between laser wavelengths of one μm and a half μm. Density structure of the laser-irradiated surface of a planar tin target has beem measured experimentally at 1012 W/cm2 to show formation of double ablation structure with density plateau by thermal radiation transport. An opacity experiment has just been initiated.

Paper Details

Date Published: 7 January 2004
PDF: 9 pages
Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); doi: 10.1117/12.504166
Show Author Affiliations
Mitsuo Nakai, Osaka Univ. (Japan)
Hiroaki Nishimura, Osaka Univ. (Japan)
Keisuke Shigemori, Osaka Univ. (Japan)
Noriaki Miyanaga, Osaka Univ. (Japan)
Takayoshi Norimatsu, Osaka Univ. (Japan)
Keiji Nagai, Osaka Univ. (Japan)
Ryoji Matsui, Osaka Univ. (Japan)
Takehiro Hibino, Osaka Univ. (Japan)
Tomoharu Okuno, Osaka Univ. (Japan)
F. S. Sohbatzadeh, Osaka Univ. (Japan)
Y. Tao, Osaka Univ. (Japan)
Kazuhisa Hashimoto, Osaka Univ. (Japan)
Michiteru Yamaura, Osaka Univ. (Japan)
Shinsuke Fujioka, Osaka Univ. (Japan)
Hideo Nagatomo, Osaka Univ. (Japan)
Vasilii Zhakhovskii, Osaka Univ. (Japan)
Katsunobu Nishihara, Osaka Univ. (Japan)
Shigeaki Uchida, Osaka Univ. (Japan)
Yoshinori Shimada, Osaka Univ. (Japan)
Hiroyuki Furukawa, Osaka Univ. (Japan)
Masahiro Nakatsuka, Osaka Univ. (Japan)
Yasukazu Izawa, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 5196:
Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications
George A. Kyrala; Jean-Claude J. Gauthier; Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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