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Proceedings Paper

Photomask and lithography technologies: past 10 years and what will come next
Author(s): Koichiro Hoh
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Paper Abstract

On the occasion of 10th conference of Photomask Japan, the advancement of this conference in the past decade is briefly reviewed and some emerging technologies related to lithography are discussed with examples.

Paper Details

Date Published: 28 August 2003
PDF: 3 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504045
Show Author Affiliations
Koichiro Hoh, Univ. of Tokyo (Japan)

Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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