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Proceedings Paper

Matching different size masks to effectively improve stepper throughput
Author(s): Fu-Tien Weng; Hung-Jen Hsu; Chih-Kung Chang; Yu-Kung Hsiao
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Paper Abstract

Color filter process is after passivation layer technology. Front end wafers may be produced by different size masks. For example, if front end stepper were 5" mask system, but color filter production line is 6 " mask, throughput will be very slow (6" mask but is 5" layout). Different foundries used different size masks & stepping systems (avoid guard ring) for production caused more complicated for different size masks matching. Color process use high energy, so may impact stepper throughput & Lens quality also. Improve throughput & prolong Lens life are very important for production. Using the matching system we can improve stepper (Example: 5"layout changed to 6" layout on 6" mask) throughput effectively & prolong ASML lens life.

Paper Details

Date Published: 24 April 2003
PDF: 4 pages
Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); doi: 10.1117/12.501442
Show Author Affiliations
Fu-Tien Weng, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Hung-Jen Hsu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chih-Kung Chang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yu-Kung Hsiao, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 5116:
Smart Sensors, Actuators, and MEMS
Jung-Chih Chiao; Vijay K. Varadan; Carles Cané, Editor(s)

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