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Proceedings Paper

Fabrication of phase structures with continuous and multilevel profile for diffraction optics
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Paper Abstract

This paper presents the investigation results of a new photolithographic fabrication method of highly effective diffractive optical elements (DOE). The method, unlike the well-known multilevel one, does not require a set of masks prepared and aligned. It is demonstrated that the application of half-tone image binarization technique allows one to fabricate a DOE with continuous phase profile and high diffractive efficiency, which can be achieved with a single raster mask and an optical projection system of a photolithography setup used as low-pass spatial filter. Using the algorithm of pulse-width modulation experimental samples of DOE aberration correctors and kinoform lens array with the numerical aperture NA equals 0.1 were fabricated. The diffraction efficiency of these elements, fabricated with conventional photolithography equipment, was more than 80%.

Paper Details

Date Published: 1 October 1991
PDF: 12 pages
Proc. SPIE 1574, Intl Colloquium on Diffractive Optical Elements, (1 October 1991); doi: 10.1117/12.50129
Show Author Affiliations
Alexander G. Poleshchuk, Institute of Automation and Electrometry (Russia)

Published in SPIE Proceedings Vol. 1574:
Intl Colloquium on Diffractive Optical Elements
Jerzy Nowak; Marek Zajac, Editor(s)

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