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Proceedings Paper

Optimizing deep lithography with protons for the fabrication of 2D fiber alignment structures
Author(s): Rafal G. Krajewski; Bart Volckaerts; Heidi Ottevaere; Pedro Vynck; Jan Watte; Daniel Daems; Malgorzata Kujawinska; Alex Hermanne; Hugo Thienpont
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Paper Abstract

In this paper we present Deep Lithography with Protons (DLP) as a promising technology for the fabrication of mechanical fiber alignment structures accurately ordered in massive 2D arrays. The fabrication process consists of irradiating PMMA-resist layers with high-energetic proton beams through a lithographic mask with a well-defined circular shape, followed by a selective development of these irradiated zones. To increase the coupling efficiency, we can additionally integrate uniform spherical micro-lenses created by swelling the proton-bombarded zones in a monomer vapor. We highlight the influence of the etching time, the proton beam intensity and the absorbed doses in the PMMA layers on the diameters of the finally developed alignment holes. While selecting the correct process parameters, we prove DLP to be a suitable technology for the fabrication of circular micro-holes with diameters of 125&mum and 155&mum at the front and the back side of a 500&mum thick PMMA plate respectively. We finally illustrate the potentialities of these type of fiber holding plates to realize a user-friendly and accurate 2D fibre positioning component.

Paper Details

Date Published: 3 October 2003
PDF: 11 pages
Proc. SPIE 5145, Microsystems Engineering: Metrology and Inspection III, (3 October 2003); doi: 10.1117/12.501255
Show Author Affiliations
Rafal G. Krajewski, Warsaw Univ. of Technology (Poland)
Bart Volckaerts, Vrije Univ. Brussel (Belgium)
Heidi Ottevaere, Vrije Univ. Brussel (Belgium)
Pedro Vynck, Vrije Univ. Brussel (Belgium)
Jan Watte, Tyco Electronics (Belgium)
Daniel Daems, Tyco Electronics (Belgium)
Malgorzata Kujawinska, Warsaw Univ. of Technology (Poland)
Alex Hermanne, Vrije Univ. Brussel (Belgium)
Hugo Thienpont, Vrije Univ. Brussel (Belgium)

Published in SPIE Proceedings Vol. 5145:
Microsystems Engineering: Metrology and Inspection III
Christophe Gorecki, Editor(s)

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