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Proceedings Paper

Micro/nano moire methods
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Paper Abstract

Two novel micro/nano moire method, SEM scanning moiré and AFM scanning moire techniques are discussed in this paper. The principle and applications of two scanning moire methods are described in detail. The residual deformation in a polysilicon MEMS cantilever structure with a 5000 lines/mm grating after removing the SiO2 sacrificial layer is accurately measured by SEM scanning moire method. While AFM scanning moire method is used to detect thermal deformation of electronic package components, and formation of nano-moire on a freshly cleaved mica crystal. Experimental results demonstrate the feasibility of these two moire methods, and also show they are effective methods to measure the deformation from micron to nano-scales.

Paper Details

Date Published: 3 October 2003
PDF: 6 pages
Proc. SPIE 5145, Microsystems Engineering: Metrology and Inspection III, (3 October 2003); doi: 10.1117/12.500902
Show Author Affiliations
Anand Krishna Asundi, Nanyang Technological Univ. (Singapore)
Haixia Shang, Tsinghua Univ. (China)
Huimin Xie, Tsinghua Univ. (China)
Biao Li, Tsinghua Univ. (China)

Published in SPIE Proceedings Vol. 5145:
Microsystems Engineering: Metrology and Inspection III
Christophe Gorecki, Editor(s)

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