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Proceedings Paper

Optical measurement of electric fields
Author(s): Andreas Steiger; M. Inmaculada de la Rosa; Conception Perez; Minja Gemisic; Klaus Gruetzmacher; Joachim Seidel
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Paper Abstract

Local electric field strengths in low density plasmas can be measured directly by Doppler-free two-photon spectroscopy of atomic hydrogen mostly present in such discharges. This method is based on the Stark-splitting of the atomic resonance lines and causes no significant perturbation to the discharge. For this purpose, we take advantage of our advanced pulsed UV-laser spectrometers which provide not only the peak power needed for two-photon excitation but also the high spectral resolution to resolve the atomic hyperfine splitting. In a first experiment with opto-galvanic detection, atomic hydrogen was produced by thermal dissociation in a small cell filled with hydrogen gas and the Stark-splitting of the 1S-2S and the 1S-3S/D transition was measured. Electric fields as low as 200 V/cm and 30 V/cm respectively could be determined in accordance with theory. In addition, we have performed measurements in a hollow cathode discharge which provides higher electric fields in its cathode fall region and the 1S-2S spectrum was detected spatially resolved by means of opto-galvanic and polarization spectroscopy as well. Selected experimental results will be presented which clearly demonstrate the high potential of this optical method.

Paper Details

Date Published: 30 May 2003
PDF: 8 pages
Proc. SPIE 5144, Optical Measurement Systems for Industrial Inspection III, (30 May 2003); doi: 10.1117/12.500082
Show Author Affiliations
Andreas Steiger, Physikalisch-Technische Bundesanstalt (Germany)
M. Inmaculada de la Rosa, Univ. de Valladolid (Spain)
Conception Perez, Univ. de Valladolid (Spain)
Minja Gemisic, Physikalisch-Technische Bundesanstalt (Germany)
Klaus Gruetzmacher, Physikalisch-Technische Bundesanstalt (Germany)
Joachim Seidel, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 5144:
Optical Measurement Systems for Industrial Inspection III
Wolfgang Osten; Malgorzata Kujawinska; Katherine Creath, Editor(s)

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