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Proceedings Paper

Soft lithographic patterning of oxide thin films
Author(s): Estefania Abad; Roger W. Whatmore; Qi Zhang; Zhaorong Huang
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Paper Abstract

An emerging non-photolithographic technology, soft lithography, is applied with the aim of patterning ferroelectric thin film oxides, in particular sol-gel deposited Lead Zirconate Titanate (PZT). Soft lithography relies on the replication of a patterned master using an elastomeric material and then, using this as a stamp to create micro- and nanometer scale patterns and structures. Following this procedure, a set of masters were fabricated both using photolithographic and Focused Ion Beam (FIB) methods. Masters were replicated using a commercial polymer (PDMS), satisfactorily reproducing the negative of the master’s features down to a limit of 500 nm. The obtained stamps were used to produce patterned self-assembled monolayers (SAMs) of alkanethiols over surfaces of gold, using the technique of microcontact printing (mCP). The patterned SAMs were then employed as a molecular thin resist to create microstructures of gold by wet etching. This is a key step for establishing a new route for the fabrication of ferroelectric thin film capacitors made of Pt/PZT/Au by Reactive Ion Etching (RIE) using the patterned gold features as both mask and top electrode, thus avoiding alignment stages in the fabrication procedure.

Paper Details

Date Published: 24 April 2003
PDF: 9 pages
Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); doi: 10.1117/12.499780
Show Author Affiliations
Estefania Abad, Cranfield Univ. (United Kingdom)
Fundacion Tekniker (Spain)
Roger W. Whatmore, Cranfield Univ. (United Kingdom)
Qi Zhang, Cranfield Univ. (United Kingdom)
Zhaorong Huang, Cranfield Univ. (United Kingdom)

Published in SPIE Proceedings Vol. 5116:
Smart Sensors, Actuators, and MEMS
Jung-Chih Chiao; Vijay K. Varadan; Carles Cané, Editor(s)

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