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Proceedings Paper

Development of microstructure in nanostructures and thin films
Author(s): Max O Bloomfield; Yeon Ho Im; Jian Wang; Hanchen Huang; Timothy S. Cale
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Paper Abstract

We have created a finite-element based, multiple-material, levelset-based code to implicitly represent and track evolving islands and grains. With this method, the code can track island growth in three dimensions through nucleation to coalescence into a grain structure. We discuss the numerical methods, capabilities, and limitations of the code, and then examine the microstructures that result from different models of growth based on starting structures derived from atomistic Monte Carlo simulations. We show simulation results from a kinetically limited process (electroless deposition), a transport-limited process (physical vapor deposition), and a process neither transport nor kinetically limited (physical vapor deposition with orientation dependent sticking factors).

Paper Details

Date Published: 29 April 2003
PDF: 12 pages
Proc. SPIE 5118, Nanotechnology, (29 April 2003); doi: 10.1117/12.499465
Show Author Affiliations
Max O Bloomfield, Rensselaer Polytechnic Institute (United States)
Yeon Ho Im, Rensselaer Polytechnic Institute (United States)
Jian Wang, Rensselaer Polytechnic Institute (United States)
Hanchen Huang, Rensselaer Polytechnic Institute (United States)
Timothy S. Cale, Rensselaer Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 5118:
Nanotechnology
Robert Vajtai; Xavier Aymerich; Laszlo B. Kish; Angel Rubio, Editor(s)

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