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Proceedings Paper

Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic
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Paper Abstract

Carbon deposition in EUVL is known to occur when optical surfaces in a hydrocarbon environment are exposed to EUV light. Carbon contamination on EUV optical elements affects both the absorption and phase of the reflected light. Because the carbon deposition alters the phase structure of the reflected EUV light it effectively alters the figure of these optics and, thus, the aberrations as well. Absorption by deposited carbon not only reduces throughput but also leads to apodisation of the pupil, which in turn affects imaging performance.

Paper Details

Date Published: 16 June 2003
PDF: 10 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.499372
Show Author Affiliations
Anton Barty, Lawrence Livermore National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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