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Proceedings Paper

A simple method to fabricate buried channel optical waveguides based on porous silicon
Author(s): Zhenhong Jia; Chuzhe Tu; Jun Zhou; Rui Li
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Paper Abstract

The oxidised porous silicon buried channel waveguides were fabricated by selectively anodized with a PMMA film mask and controlling the electric current density intensities and anodisation time during anodisation process is reported in this paper. The propagaion loss of this oxidised porous silicon buried channel waveguides was measured to be 9.2dB/cm.

Paper Details

Date Published: 24 April 2003
PDF: 5 pages
Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); doi: 10.1117/12.498856
Show Author Affiliations
Zhenhong Jia, Xinjiang Univ. (China)
Chuzhe Tu, Xinjiang Univ. (China)
Jun Zhou, Shandong Univ. of Science and Technology (China)
Rui Li, Xinjiang Univ. (China)

Published in SPIE Proceedings Vol. 5116:
Smart Sensors, Actuators, and MEMS
Jung-Chih Chiao; Vijay K. Varadan; Carles Cané, Editor(s)

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