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Proceedings Paper

Carbon layers for integrated optics
Author(s): Vaclav Prajzler; Ivan Huettel; Josef Schroefel; Pavla Nekvindova; Jan Gurovic; Anna Mackova
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Paper Abstract

Study of fabrication and properties of the carbon layers by using the PACVD (Plasma Assisted Chemical Vapor Deposition) apparatus is reported. The layers were grown on silicon substrates with methane as the precursor and were then doped with the erbium ions by treating the fabricated samples in glycerin or in the solution of erbium nitrate. To obtain deeper erbium containing carbon layers (up to 1 μm) the “sandwich method” was used based on repetition (three times) of carbon deposition and subsequent diffusion of erbium after which followed annealing in vacuum oven. The obtained results proved that it is in principle possible to fabricate the erbium containing carbon thin optical layers.

Paper Details

Date Published: 8 July 2003
PDF: 6 pages
Proc. SPIE 5036, Photonics, Devices, and Systems II, (8 July 2003); doi: 10.1117/12.498535
Show Author Affiliations
Vaclav Prajzler, Czech Technical Univ. in Prague (Czech Republic)
Ivan Huettel, Prague Institute of Chemical Technology (Czech Republic)
Josef Schroefel, Czech Technical Univ. in Prague (Czech Republic)
Pavla Nekvindova, Prague Institute of Chemical Technology (Czech Republic)
Jan Gurovic, Czech Technical Univ. in Prague (Czech Republic)
Anna Mackova, Nuclear Physics Institute (Czech Republic)

Published in SPIE Proceedings Vol. 5036:
Photonics, Devices, and Systems II
Miroslav Hrabovsky; Dagmar Senderakova; Pavel Tomanek, Editor(s)

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