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Proceedings Paper

High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F2 and KrF excimer lasers
Author(s): Kotaro Obata; Koji Sugioka; Tatsuya Kono; Hiroshi Takai; Koichi Toyoda; Katsumi Midorikawa
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Paper Abstract

A multiwavelength excitation process using F2 and KrF excimer lasers for high-efficiency and high-speed refractive index modification of fused silica is demonstrated. We find that this process is essentially superior to conventional single-wavelength F2 laser processing. The multiwavelength excitation process achieves twice of diffraction efficiency compared with that of single-wavelength F2 laser irradiation sample at the same number of total photons supplied to the sample. This high-speed and high-efficiency modification is realized within ±50 ns of the delay time of each laser beam irradiation. In addition, the refractive index change of the multiwavelength sample was increased to 8.2×10-3, which is 1.78 times larger than that of single-wavelength F2 laser irradiation sample at same irradiation time. This superiority of the wavelength excitation process is attributed to resonance photoionization-like process based on excited state absorption in fused silica.

Paper Details

Date Published: 19 February 2003
PDF: 6 pages
Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.497735
Show Author Affiliations
Kotaro Obata, Tokyo Univ. of Science (Japan)
Koji Sugioka, The Institute of Physical and Chemical Research (RIKEN) (Japan)
Tatsuya Kono, Tokyo Denki Univ. (Japan)
Hiroshi Takai, Tokyo Denki Univ. (Japan)
Koichi Toyoda, Tokyo Univ. of Science (Japan)
Katsumi Midorikawa, The Institute of Physical and Chemical Research (RIKEN) (Japan)


Published in SPIE Proceedings Vol. 4830:
Third International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Kojiro F. Kobayashi; Koji Sugioka; Reinhart Poprawe; Henry Helvajian, Editor(s)

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