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Proceedings Paper

Investigation of MoSiN etch processes for embedded attenuating phase shift mask applications utilizing a next generation ICP source
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Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, ; doi: 10.1117/12.496653
Show Author Affiliations
Jason Plumhoff, Unaxis USA, Inc. (United States)
Chris Constantine, Unaxis USA, Inc. (United States)
C. Strawn, Unaxis USA, Inc. (United States)
Russell J. Westerman, Unaxis USA, Inc. (United States)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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