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Proceedings Paper

Environmental thermal condition influence on pattern placement accuracy for electron-beam photomask writing
Author(s): Ryoichi Hirano; Shuichiro Fukutome; Teruaki Yamamoto; Shusuke Yoshitake; Toshio Yamaguchi; Masaki Toriumi; Kiminobu Akeno; Toru Tojo
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Paper Details

Date Published:
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Proc. SPIE 4343, Emerging Lithographic Technologies V, ; doi: 10.1117/12.496010
Show Author Affiliations
Ryoichi Hirano, Toshiba Machine Co., Ltd. (Japan)
Shuichiro Fukutome, Toshiba Machine Co., Ltd. (Japan)
Teruaki Yamamoto, Toshiba Machine Co., Ltd. (Japan)
Shusuke Yoshitake, Toshiba Machine Co., Ltd. (Japan)
Toshio Yamaguchi, Toshiba Machine Co., Ltd. (United States)
Masaki Toriumi, Toshiba Machine Co., Ltd. (Japan)
Kiminobu Akeno, Toshiba Corp. (Japan)
Toru Tojo, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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