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Proceedings Paper

The French research and development program on EUV sources, reflective optics, masks, and relevant metrologies for EUV lithography (PREUVE)
Author(s): Pierre Boher; Jean-Yves Robic; Remy Marmoret; Martin Schmidt; Claude Fleurier; Roland Geyl; Jean-Jacques Ferme; Bernard Vidal
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Proc. SPIE 4343, Emerging Lithographic Technologies V, ; doi: 10.1117/12.495989
Show Author Affiliations
Pierre Boher, SOPRA S.A. (France)
Jean-Yves Robic, LETI/CMO/CENG (France)
Remy Marmoret, CEA (France)
Martin Schmidt, C.E. Saclay (France)
Claude Fleurier, Univ. d'Orleans (France)
Roland Geyl, SAGEM (France)
Jean-Jacques Ferme, SESO (France)
Bernard Vidal, Lab. d'Optique Electromagnetique (France)


Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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