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Proceedings Paper

Development and evaluation of new photosensitive polyimide electron beam resists
Author(s): Wei-Chih Chen; Tsann-Bim Chiou; Yu-Der Lee
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Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, ; doi: 10.1117/12.495966
Show Author Affiliations
Wei-Chih Chen, National Tsing Hua Univ. (Taiwan)
Tsann-Bim Chiou, National Nano Device Labs. (Taiwan)
Yu-Der Lee, National Tsing Hua Univ. (Taiwan)


Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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