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Proceedings Paper

KrF lithography for 0.13-um contact pattern
Author(s): Chungwei Hsu; Ronfu Chu; Hung-Wen Lin; Chia-Chen Yeh
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Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, ; doi: 10.1117/12.495965
Show Author Affiliations
Chungwei Hsu, Nanya Technology Corp. (Taiwan)
Ronfu Chu, Nanya Technology Corp. (Taiwan)
Hung-Wen Lin, Nanya Technology Corp. (Taiwan)
Chia-Chen Yeh, Nanya Technology Corp. (Taiwan)


Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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