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Proceedings Paper

New 248-nm bottom antireflective coatings (BARCs) for dual damascene process
Author(s): Satoshi Takei; Yasuhisa Sone; Kenichi Mizusawa; Hiroyoshi Fukuro
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Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, ; doi: 10.1117/12.495963
Show Author Affiliations
Satoshi Takei, Nissan Chemical Industries, Ltd. (Japan)
Yasuhisa Sone, Nissan Chemical Industries, Ltd. (Japan)
Kenichi Mizusawa, Nissan Chemical Industries, Ltd. (Japan)
Hiroyoshi Fukuro, Nissan Chemical Industries, Ltd. (Japan)


Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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