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Proceedings Paper

Novel method of control of the lens heating and focus drift correction in a photolithographic system via automation
Author(s): Jiyou Guo; Ron Hou; Yuanting Cui; Julian Lee
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Paper Details

Date Published:
Proc. SPIE 4346, Optical Microlithography XIV, ; doi: 10.1117/12.495949
Show Author Affiliations
Jiyou Guo, WaferTech LLC (United States)
Ron Hou, WaferTech LLC (United States)
Yuanting Cui, WaferTech LLC (United States)
Julian Lee, WaferTech LLC (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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