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Stress-optical coefficients of CaF2, BaF2, and fused silica in the visible and the ultraviolet
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Proc. SPIE 4346, Optical Microlithography XIV, ; doi: 10.1117/12.495931
Show Author Affiliations
John H. Burnett, National Institute of Standards and Technology (United States)
Ulf Griesmann, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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