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Proceedings Paper

Photoelastic investigation of statics, kinetics, and dynamics of crack formation in transparent models and natural structural elements
Author(s): B. I. Taratorin; V. N. Sakharov; O. U. Komlev; V. N. Stcherbakov; A. V. Starchevsky
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Paper Abstract

Calculation techniques determining crack-resistance parameters, finite element techniques among them, can not still provide a full-scale solution of problems emerging in design of crack-resistance structures. Of increasing value therefore become development and improvement of experimental methods, in particular, of photoelasticity method for determining crack resistance parameters on models of polymer birefringent materials and also on natural materials using birefringent coatings.

Paper Details

Date Published: 1 December 1991
Proc. SPIE 1554, Second International Conference on Photomechanics and Speckle Metrology, (1 December 1991); doi: 10.1117/12.49566
Show Author Affiliations
B. I. Taratorin, Moscow Civil Engineering Institute (Russia)
V. N. Sakharov, Moscow Civil Engineering Institute (Russia)
O. U. Komlev, Moscow Civil Engineering Institute (Russia)
V. N. Stcherbakov, Moscow Civil Engineering Institute (Russia)
A. V. Starchevsky, Moscow Civil Engineering Institute (Russia)

Published in SPIE Proceedings Vol. 1554:
Second International Conference on Photomechanics and Speckle Metrology
Fu-Pen Chiang; Fu-Pen Chiang, Editor(s)

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