Share Email Print
cover

Proceedings Paper

Negative tone resist for seaming at trench planarization
Author(s): Christine Fischer; Dan Sutton
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
PDF
Proc. SPIE 4181, Challenges in Process Integration and Device Technology, ; doi: 10.1117/12.494581
Show Author Affiliations
Christine Fischer, Advanced Micro Devices, Inc. (United States)
Dan Sutton, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 4181:
Challenges in Process Integration and Device Technology
David Burnett; Shin'ichiro Kimura; Bhanwar Singh, Editor(s)

© SPIE. Terms of Use
Back to Top